Category for wafer cleaning equipment dedicated to semiconductor manufacturing processes. Includes specialized cleaning equipment for removing surface contaminants, particles, organic substances, and metallic impurities from silicon wafers. Covers chemical cleaning systems such as RCA cleaning equipment, megasonic cleaning equipment, spin cleaning equipment, single-wafer cleaning equipment, batch cleaning equipment, SPM cleaning equipment, and DHF cleaning equipment. Designed for use in cleanroom environments, these systems are essential for quality assurance in both front-end and back-end semiconductor manufacturing processes and are clearly distinguished from etching equipment and CVD equipment.