Equipment group for detailed analysis of surface conditions, composition, and structure of materials and products. In manufacturing, these systems quantitatively evaluate surface chemical composition, crystal structure, roughness, and contamination status for quality control, material development, and defect analysis. Through analytical methods such as XPS, AES, SIMS, AFM, STM, and SEM-EDS, they characterize surface layer properties from nano-level perspectives, contributing to product performance improvement and process optimization. Essential analytical technology for semiconductors, metal processing, coating, and electronic component manufacturing.